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. 2019 Apr 5;10:1584. doi: 10.1038/s41467-019-09531-0

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© The Author(s) 2019

Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.

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Fig. 2 — Characterization of the morphology and the occupation sites of the incorporated ions. a Optical image of as-prepared (Co, Cr)-MoS₂ monolayer on 300 nm SiO₂/Si substrates prepared by CVD. b AFM image, c HRTEM image, d EDX elemental mapping images, e HAADF-STEM image, and f the intensity spectra of the selected area of (Co, Cr)-MoS₂ monolayer. g The FT curves of the Co, Cr K-edge EXAFS kχ(k) functions for (Co, Cr)-MoS₂ monolayer_. The Mo K-edge FT curve for MoS₂ bulk reference are also displayed. h The atomic model of the (Co, Cr)-MoS₂ monolayer