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. 2019 Apr 26;13:385. doi: 10.3389/fnins.2019.00385

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Copyright © 2019 Viswam, Obien, Franke, Frey and Hierlemann.

This is an open-access article distributed under the terms of the Creative Commons Attribution License (CC BY). The use, distribution or reproduction in other forums is permitted, provided the original author(s) and the copyright owner(s) are credited and that the original publication in this journal is cited, in accordance with accepted academic practice. No use, distribution or reproduction is permitted which does not comply with these terms.

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CMOS high-density microelectrode array (HD-MEA) and electrodes of varying size. (A) Die micrograph of the CMOS-based microelectrode system (Frey et al., 2009, 2010), fabricated in a 0.6-μm CMOS 3M2P process, that was used for extracellular neuronal recording and stimulation. The electrode array was integrated into a microsystem chip and featured a total of 11,011 electrodes in an area of 1.99 × 1.75 mm². (B) Bright Pt electrodes of four different sizes (el1: 10 × 8.6 μm², el2: 6.6 × 6.6 μm², el3: 4.7 × 4.7 μm², el4: 3.3 × 3.3 μm²). (C) The same electrodes after Pt-black deposition.