Figure 5.

Nanopore arrays fabricated by electron beam lithography (EBL)-assisted fabrication technologies. (a) A nanopore array with an average diameter of 18 ± 2 nm, manufactured using the EBL-assisted RIE method (reprinted with permission from [86], copyright 2014, Royal Society of Chemistry). Ordered Al₂O₃ nanopores with (b) hexagonal and (c) square shapes prepared by nanoimprinting (reprinted with permission from [89], copyright 2010, American Chemical Society). (d) Nanopore arrays with a sub-10 nm diameter and 40 nm pitch fabricated by nanoimprinting (reprinted with permission from [88], copyright 1997, AIP Publishing).