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. 2019 Mar 29;10(4):225. doi: 10.3390/mi10040225

Figure 3.

Figure 3

(a) SU8 photoresist electrode structure with electrodeposited SU8 photoresist nanowires, (b) after UV curing and development, and (c,d) finally carbonized in a furnace; (e,f) resistance changes measured in the nanowire after decoration with the aptamer and addition of Salmonella bacteria. Reprinted from [23], Copyright 2018, with permission from Elsevier.