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. Author manuscript; available in PMC: 2019 May 23.
Published in final edited form as: Nanotechnology. 2018 Jun 18;29(36):365302. doi: 10.1088/1361-6528/aacd33

Fig. 4.

Fig. 4.

(a) UV-resin filling ratio, which represents the replication fidelity, of different UV-resin molds replicated from Si master mold during UV-NIL. In general, the UV-resin filling ratio decreases as the nanochannel depth increases. TPGDA mold with the smallest monomer size shows the highest filling ratio. (b) Schematic image of monomers with different sizes filling into sharp nanostructures, showing that UV-resins with smaller monomers show better filling into sharp nanostructures.