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. 2019 Jun 4;14:191. doi: 10.1186/s11671-019-3025-8

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© The Author(s). 2019

Open AccessThis article is distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution, and reproduction in any medium, provided you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made.

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Fig. 5 — a Schematic depicting application of stress voltage during the pulsed I_DS-V_DS measurements. Pulsed I_DS-V_DS characteristics of the fabricated AlGaN/GaN HEMTs with b FPL HEMT, c FBL HEMT, and d Conv. HEMT (V_GS = − 4~0 V; step: 0.5 V)