Figure 5.

A sectional view showing the different layers involved in etching a silicon wafer (Stage 1: blank silicon wafer, Stage 2: silicon wafer with chrome layer, Stage 3: silicon wafer with chrome and photo resist layer, Stage 4: gripper pattern exposed into photo resist layer, Stage 5: gripper pattern in photo resist developed, Stage 6: chrome around developed gripper pattern removed, Stage 7: silicon etched away leaving only gripper tips with the chrome layer, Stage 8: chrome removed leaving only silicon gripper tips).