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Material selection of high-k dielectric and metal gate from 45-nm to 5-nm nodes.
| Technology Nodes | Film Thickness (nm) | |||
|---|---|---|---|---|
| Thermal Oxide | High-k | TiAl(N) | TiN | |
| 45 nm | ~1.2 | ~1.5 | ~2 | ~2.1 |
| 32 nm | ~1.2 | ~1.1 | ~1.7 | ~2 |
| 22 nm | ~1.1 | ~1.0 | ~1.2 | ~1.4 |
| 14 nm | ~0.6 | ~1.2 | ~1.2 | ~1.4 |
| 5 nm | ~0.5 | ~1.0 | ~1.0 | ~1.2 |
