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Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).
Wettability of each substrate. 30 nm of Ag was deposited at 2.4 Å/s on a different substrate. (a) Contact angle images of each substrate. (b) SEM images of 30 nm Ag deposited with oblique angle deposition on different substrates.