Skip to main content
. 2019 May 10;9(5):727. doi: 10.3390/nano9050727

Figure 4.

Figure 4

Thickness calibration curves for (a) sputtered α-Si and (b) ALD SiO2, and (c) and (d) are modified AFM scans showing surface roughness of α-Si ALD SiO2 thin films. The red dotted lines outline the features patterned using conventional lithographic techniques.