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. Author manuscript; available in PMC: 2019 Jun 26.
Published in final edited form as: Phys Rev Appl. 2019 Mar 12;11(3):034029. doi: 10.1103/PhysRevApplied.11.034029

FIG. 6.

FIG. 6.

NV-layer fabrication. (a) SRIM vacancy-depth profile for implantation conditions discussed in the text. (b) Time temperature graph for the annealing procedure used in this study.