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. Author manuscript; available in PMC: 2019 Jun 30.
Published in final edited form as: Nanoscale. 2018 Nov 29;10(46):21879–21892. doi: 10.1039/c8nr03869d

Fig. 2.

Fig. 2.

(a) Diagram of photolitography in bilayer process. SEM images of different mushroom patterns showing the effect of experimental conditions: (b) Thicker photoresist (S1818), (c) under-exposure (UV exposure t < 7s) , (d) prebake step of LOR10B (t, T > 2 min, 150 ºC), (e) optimal conditions, (f) over-development (t > 25 s). Scale bars 2 μm.