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. 2019 Jun 25;10:1290–1302. doi: 10.3762/bjnano.10.128

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Copyright © 2019, Grünewald et al.

This is an Open Access article under the terms of the Creative Commons Attribution License (https://creativecommons.org/licenses/by/4.0). Please note that the reuse, redistribution and reproduction in particular requires that the authors and source are credited.

The license is subject to the Beilstein Journal of Nanotechnology terms and conditions: (https://www.beilstein-journals.org/bjnano/terms)

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SEM images after structuring the pattern according to Equation 3 with k_ρ = 10 µm⁻¹ for (a) a FIB-prepared and (b) a floated aC thin film. Since the latter is smoother, the sinusoidal structure has a better quality. (c) The generated sinusoidal structure is visible in the bright-field TEM image of a cross-section lamella of a PM with k_ρ = 5 µm⁻¹. Pt was deposited on top to protect the structure during TEM lamella fabrication. We stabilized the free-standing thin films for the lamella preparation by filling the pyramid-shaped trenches with glue. (d) The scheme presents a possible explanation for fast hole formation towards the end of the pattern milling process. The middle scheme corresponds to the situation shown in (c).