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. 2019 Jun 18;26(Pt 4):1213–1219. doi: 10.1107/S1600577519005423

Table 1. Measured electron source size (Inline graphic) by a pinhole at the XSR beamline made as the vertical source size was changed using skew quadruples. Included are measurements by the ps-BPM system at the BMIT beamline of the electron source size (Inline graphic), average source position (Inline graphic), divergence (Inline graphic), average angular position (Inline graphic), and the average beam position (Inline graphic + Inline graphic).

Inline graphic (µm) Inline graphic (µm) Inline graphic (µm) Inline graphic (µrad) Inline graphic (µrad) Inline graphic + Inline graphic (µm)
83.6 98.0 ± 2.6 271 ± 8 21.11 ± 0.11 0.90 ± 0.61 294 ± 15
76.6 89.1 ± 2.8 277 ± 8 20.24 ± 0.08 0.53 ± 0.62 290 ± 16
70.7 84.2 ± 2.6 277 ± 8 19.41 ± 0.10 0.66 ± 0.63 294 ± 16
66.5 74.3 ± 3.1 283 ± 8 18.99 ± 0.08 0.33 ± 0.71 291 ± 18
65.2 75.3 ± 3.7 278 ± 8 18.80 ± 0.06 0.70 ± 0.65 297 ± 16
65.6 76.5 ± 2.1 276 ± 8 19.05 ± 0.10 0.73 ± 0.68 295 ± 17
82.4 96.1 ± 2.2 269 ± 8 21.02 ± 0.11 0.62 ± 0.62 285 ± 16
89.8 103.8 ± 3.1 266 ± 8 22.20 ± 0.15 0.80 ± 0.65 286 ± 16
98.2 111.8 ± 2.2 263 ± 8 23.56 ± 0.15 0.89 ± 0.62 286 ± 15
106.8 122.4 ± 1.4 261 ± 8 25.14 ± 0.12 0.76 ± 0.62 281 ± 15