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. 2019 Apr 17;9(2):57. doi: 10.3390/bios9020057

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© 2019 by the authors.

Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).

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Fabrication of the nanopillar array with tips covered by a gold layer. (a) A silicon nanopillar array (master) is fabricated by EBL; (b) the master pattern is transferred to the polymer by ultraviolet (UV) curable nanoimprint lithography (NIL); (c,d) the final polymer nanopillar array is fabricated with a second round of NIL; (e) deposition of a gold layer; (f) exposition to the solvent and drying makes the nanopillars collapse on each other forming hot spots. Reproduced with permission form Ou et al. [358]. Copyright (2011), the American Chemical Society.