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. 2017 Feb 28;2(2):738–745. doi: 10.1021/acsomega.6b00294

Figure 4.

Figure 4

(a) Optical image of large-scale (250 μm × 250 μm) laser etching performed on the solution-exfoliated WS2 flakes deposited onto a Si/SiO2 wafer. (b) SEM image showing the same patterned area. (c) Increased magnification image showing the interface between the laser-etched and pristine deposited WS2 flakes.