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. 2019 Jul 22;6:24. doi: 10.1186/s40580-019-0194-1

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© The Author(s) 2019

Open AccessThis article is distributed under the terms of the Creative Commons Attribution 4.0 International License (http://creativecommons.org/licenses/by/4.0/), which permits unrestricted use, distribution, and reproduction in any medium, provided you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made.

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Fig. 4 — Deconvoluted XPS spectra (M–O, V_O, and M–OH) of O 1S in a IGZO channel region and b Al₂O₃ dielectric region before and after post-annealing. c XPS depth profile representing atomic percentages of M–O, V_O, and M–OH before and after post-annealing of IGZO/Al₂O₃ layers