. 2019 Jul 8;11(7):1160. doi: 10.3390/polym11071160

Table 4.

Typical additives used for PS membrane fabrication with their conditions.

PS	Solvent/Non-Solvent	Additive	Morphology		Configuration	Ref.
PS (Mw = 30 kDa)	1. NMP/water 2. DMAc/water	PVP (Mw = 24, 40 and 360 kDa)	Pore density	PS/NMP/PVP: 2.6 × 10⁹–9.8 × 10⁹	Flat-sheet	[43]
			Pore density	PS/DMAc/PVP: 5.5 × 10⁹–10.5 × 10⁹
			Pore size (nm)	PS/NMP/PVP: 3.0–3.62
			Pore size (nm)	PS/DMAc/PVP: 3.21–3.88
PS (Udel 1700)	DMAc/water	PVP (K15, Janssen Chemical)	Flat-sheet: macrovoids. hollow fibers: large pores on the external surface with a spongy structure underneath.		Flat-sheet and hollow fibers	[128]
PS (Mn = 26 kDa)	NMP/water	1. PEG, (Mn = 8 kDa) 2. PVP (Mn = 8 and 40 kDa)	Pore size (nm)	PS: 59–61.8	Flat-sheet	[129]
				PS+PEG: 113.8
				PS+PVP: 60.6–75
PS (Ultrason S6010)	NMP/water	Tetronic- 1107	Pore size (nm)	7–13	Flat-sheet	[111]
PS (Mw = 77–83 kDa)	NMP/water	1. graphene oxide (GO) nanosheets 2. Janus graphene oxide (Janus GO) nanosheets	Pore size (nm):	PS: 11.21	Flat-sheet	[80]
				GO/PS: 15.82–19.67
				JanusGO/PS: 18.50–21.01
			Thickness (μm):	200
PS	1. NMP/water 2. DMAc/water	polyethylene glycol (PEG), TiO₂	Molecular weight cut-off (MWCO)	<600 Da	Flat-sheet	[81]
PS (Ultrason S 6010)	DMF/water	1. SiO₂ nanoparticle 2. Polydopamine (PDA)	Root-mean-square (RMS) (nm)	PS: ~30	Flat-sheet	[38]
				PS/PDA: ~210
				PS/SiO₂: ~92
				PS/SiO₂/PDA: ~89
PS (Mn = 22 kDa)	DMAc/water	1.Zn, Al-NO₃LDH; 2. Trimethylsilylchlorosulfonate	Thickness (μm):	100	Flat-sheet	[39]
PS (M_W = 75 kDa)	NMP/water	1. PEG (M_W = 4 kDa); 2. Al₂O₃ nanoparticle	RMS (nm)	PS: ~69	Flat-sheet	[40]
PS (M_W = 75 kDa)	NMP/water	1. PEG (M_W = 4 kDa); 2. Al₂O₃ nanoparticle	RMS (nm)	PS/Al₂O₃: ~96–119	Flat-sheet	[40]
PS (Mw = 58 kDa)	DMAc/water	1. Reduced graphene (rGO)	Thickness (μm)	CMPS: 20–25	Flat-sheet	[33]
PS (Mw = 58 kDa)	DMAc/water	1. Reduced graphene (rGO)	Thickness (μm)	CMPS/rGO: 22–30	Flat-sheet	[33]