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. 2019 Jul 24;12(15):2350. doi: 10.3390/ma12152350

Table 3.

Characteristics of positive tone photoresists based on photocleavable epoxy-based thermosets.

Resin Formulation D0 [J/cm2] D100 [J/cm2] γ Resolution [µm]
epoxy-NBE/HHMPA 16.3 2.27 1.17 8
epoxy-NBE/HHPA 19.5 0.26 0.53 >10
epoxy-NBE/DDSA 19.7 0.25 0.53 >10