a-c, Optical micrographs of quartz pieces after E-beam writing and development, including 200 nm diameter pillars with a 2.5 μm pitch (a), bars with varying widths (b), CUI patterns (c). d-f, Optical micrographs of quartz pieces after metal deposition and lift-off, including 200 nm diameter pillars with a 2.5 μm pitch (d), bars with varying widths (e), CUI patterns (f). Scale bars, 5 μm.