Table 1.

Typical methods to fabricate solid-state surface-enhanced Raman scattering (SERS) substrates.

Method	SERS Performance	Repeatability	Uniformity	Substrate Area	Preparation Time	Preparation Cost
AAO [10,11,12]	high	good	good	wafer-level	short	lower
NSL [13,14,15,16,17,18,19,20,21,22,23,24,25,26]	higher	good	good	wafer-level	short	lower
EBL [27,28,29]	high	best	best	small	long	high
Self-Assembly [30,31,32,33,34,35,36,37]	high	best	best	wafer-level	short	low
OAD [38,39,40]	higher	best	best	wafer-level	shorter	lower