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. 2019 Sep 24;14(9):e0222928. doi: 10.1371/journal.pone.0222928

Fig 1. The cross-sectional TEM image for GaN/InGaN multiple quantum well heterostructures.

Fig 1

In the MQWs heterostructure, the thicknesses of the InGaN well and GaN barrier were chosen to be 2 nm and 11 nm for the heterostructure samples.