Table 1.
N:Cu2O thin film sample naming and corresponding gas flows used during the sputter deposition process.
| Sample Name | N2/Ar/O2 (sccm) |
|---|---|
| Reference sample | 0/42.5/7.5 |
| 1 | 1/41.5/7.5 |
| 2 | 2/40.5/7.5 |
| 3 | 3/39.5/7.5 |
| 4 | 5/37.5/7.5 |
| 5 | 10/32.5/7.5 |
| 6 | 15/27.5/7.5 |
Official websites use .gov
A
.gov website belongs to an official
government organization in the United States.
Secure .gov websites use HTTPS
A lock (
) or https:// means you've safely
connected to the .gov website. Share sensitive
information only on official, secure websites.