Table 2.
Compound | λabs.sol (nm) a | λem.sol (nm) b | PLQY% c | λabs.film (nm) d | λem.film (nm) e | PLQY% f |
---|---|---|---|---|---|---|
P1b | 321 (365,433) | 532 | 2.00 ± 0.02 | 466 | 606 | 34 ± 2 |
P2b | 326–420 | 498 | 1.30 ± 0.02 | 448 | 560 | 20 ± 2 |
co-P1b | 346 (453) | 518–616 | 4.50 ± 0.02 | 444 | 596 | 10 ± 1 |
co-P2b | 348 (429) | 511 | 3.00 ± 0.02 | 435 | 551 | 14 ± 2 |
Net-P1b | - | - | - | 460 | 555 | 8.0 ± 1 |
Net-P2b | - | - | - | 435 | 490 | 7.0 ± 1 |
Net-co-P1b | - | - | - | 395 | 597 | 9.0 ± 1 |
Net-co-P2b | - | - | - | 397 | 552 | 10 ± 1 |
a Wavelength of UV-Visible absorbance maxima in NMP solution, less intense maxima in branch or range; b wavelength of emission maxima in NMP solution; c wavelength of UV-Visible absorbance maxima on thin film, less intense maxima in branch; d wavelength of emission maxima on thin film; e wavelength of emission maxima on thin film; f PL quantum yield on thin film.