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(a) Schematic of the deposition process. The left side of (a) shows the plasma jet settings for different precursors; (b) changes in the contact angles of the HMDSO and AAC films under different exposure times in air; and (c) transmission spectrum response of the HMDSO and AAC thin-film coatings. The table in (c) lists the film haze (%) as a function of the carrier gas flow rate. Haze is the percentage of the incident light exceeding 2.5° to that of the total transmitted light.
