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. 2019 Sep 23;5:48. doi: 10.1038/s41378-019-0090-1

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© The Author(s) 2019

Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.

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Fig. 4 — a SEM image of the HS surface with a superhydrophilic pattern with a diameter of 300 μm (dotted circle). b SEM image of the superhydrophilic silicon surface fabricated using a femtosecond laser with a laser power of 5 mW and scanning pitch of 5 μm. c Further enlarged SEM image of b; the illustration shows the contact angle of superhydrophilic surfaces at this laser power. d EDX results for the superhydrophobic surface of the HS-SERS substrate. e EDX results of the patterned superhydrophilic regions of the HS-SERS substrate