Figure 1.

Schematic of fabrication process for patterned PDMS platform. (a)–(c) Ultra-violate (UV) lithography using SU-8 photoresist enables creation of hard mold with high aspect ratio. (d)–(f) Double cast PDMS to generate sensing and guiding patterns. (g), (h) Functionalize surface of PDMS with O₂ plasma, coat top of PDMS patterns with FN to promote cell adhesion and cover sidewall with Pluronic F-127. (i) Micrograph of fabricated PDMS platform. Cell guiding patterns consist of parallel gratings, which are 5.7 μm in width and 4.3 μm in spacing. Micropost sensing arrays, which are 3 μm in dia. and 4 μm in spacing, are integrated in between guiding gratings. (j) Micrograph of PDMS sensing posts arrays. Each post is 3 μm in dia. and 13.4 μm in height.