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. Author manuscript; available in PMC: 2019 Oct 30.
Published in final edited form as: J Adv Model Earth Syst. 2018;10(7):1571–1586. doi: 10.1029/2017MS001231

Table 1.

Formulation Comparisons Across the Five Dry Deposition Models

ZHANG Noah-GEM C5DRY WESELY MLM
Modeling framework Vd(z) = (Ra(z) + Rb + Rc)−1
and
1Rc=1WstRs+Rm+1Rns
1Rns=1Rcut+1Rac+Rg
Vd=(Ra+10hcS(z)dz+1Rac+Rg)1
and
S(z)=LAI(z)(1rs(z)+rb(z)+rm+2rb(z)+rcut)
Aerodynamic resistance (Ra) For stable conditions, Ra=0.74ln(zz0)+4.7zLκu*
For unstable conditions, Ra=0.74κu*
[ln(zz0)2ln(19zL+12)]
Ra=ln(zz0)+ψh(zL)ψh(z0L)ku*
For stable conditions, ψh=5zL
For unstable conditions,
ψh=2ln(116zL+12)
Ra=0.95[ln(zz0)+ψh(zL)ψh(z0L)]ku*
For stable conditions, ψh=5zL
For unstable conditions,
ψh=2ln(116zL+12)
For stable conditions, Ra=0.74ln(zz0)+4.7zz0Lku*
For unstable conditions, Ra=0.74κu*
{ln[19zL119zL+1]ln[19z0L119z0L+1]}
For stable conditions, Ra=4uσθ2

For unstable conditions, Ra=9uσθ2
Quasi-laminar sublayer resistance (Rb) Rb = 2(κu*)−1(Dθ/Dc)2/3 Rb = 2(κu*)−1(SC/Pr)2/3 rb(z)=α(δu)0.5
Stomatal resistance (Rs)a Rs=Rs(PAR)fTfvpdfw
1Rs(PAR)=LAIsunrs(PARsun)+LAIshaders(PARshade)
rs(PAR)=rs,minfPAR
Rs=[LAI(mAnhsCsP+b)]1 Rs=rs,minLAIfPARfTfvpdfw Rs=Rs,min{1+1[200(RG+0.1)]2}400Ts(40Ts) rs(z)=rs,minfPARfTfvpdfw
Cuticular resistance (Rcut) For dry surface, Rcut=Rcutd0e0.03RHLAI0.25u*
For wet surface, Rcut=Rcutw0LAI0.5u*
Prescribed values for dry and wet surfaces; Rcut,dry for O3 is adjusted if RH >70%: Rcut = Rcut, dry(1 − FRH) + Rcut, wet × FRH
FRH = (RH − 70)/30
Prescribed values for dry and wet surfaces Prescribed values for dry and wet surfaces
In-canopy aerodynamic resistance (Rac) Rac=Rac0LAI0.25u*2 Rac=14LAIhcu* Prescribed values Rac=[hfree+6.86×1061+2iuLcln(z/z0)Re0.8]1
Ground resistance (Rg) Prescribed values for dry and wet surfaces; adjusted if frozen Prescribed values for dry and wet surfaces; adjusted if frozen Prescribed values for dry and wet surfaces; adjusted if frozen Prescribed values for dry and wet surfaces; adjusted if frozen

Note. Wst = the fraction of stomatal blocking under wet conditions; Rm/rm = the mesophyll resistance; z = reference height; z0 = the roughness length for momentum; L = the Obukhov length; κ = the von Karman’s constant; u* = the friction velocity; u = the mean wind speed; σθ = the standard deviation of the wind direction; Dθ = the thermal diffusivity; Dc = the molecular diffusivity of a specific gas; Sc = the Schmidt number; Pr = the Prandtl number for air; α = the constant depending on gas species; δ = the characteristic leaf dimension; fPAR = the environmental stress function of radiation; fT = the environmental stress function of temperature; fvpd = the environmental stress function of humidity; fw = the environmental stress function of leaf water potential; LAIsun = the total sunlit leaf area indexes; LAIshade = the total shaded leaf area indexes; PARsun = the photosynthetically active radiation (PAR) received by sunlit leaves; PARshade = PAR received by shaded leaves; rs,min = the minimum leaf stomatal resistance for water vapor; Rs,min = the minimum canopy stomatal resistance for water vapor; An = net CO2 assimilation/photosynthesis rate; hs = the relative humidity (RH) fraction at the leaf surface, Cs = CO2 partial pressure at the leaf surface; P = the atmospheric pressure; m = the slope obtained by linear regression analysis of data from gas exchange experiments; b = the intercept obtained by linear regression analysis of data from gas exchange experiments; RG = the solar irradiation; Ts = surface air temperature; Rcutd0 = the reference value for dry cuticle resistance; Rcutw0 = the reference value for wet cuticle resistance; Rcut,dry = dry cuticle resistance; Rcut,wet = wet cuticle resistance; Rac0 = the reference value for in-canopy aerodynamic resistance; hfree = the free convection offset; iu = the turbulence intensity; Lc = a within canopy length scale; Re = the local Reynolds number.

a

Stomatal resistance for a specific gas x (Rs,x) is scaled by the ratio of molecular diffusivities (D) between the gas of interest and water vapor as follows: Rs,x = RsDH2O/Dx.