Figure 3.
SEM images acquired in a planar view of the SiNW samples deposited at the Ar/SiH4 gas pressure of 50 mTorr by varying the plasma power: (a) 20 W, (b) 30 W, and (c) 40 W.
SEM images acquired in a planar view of the SiNW samples deposited at the Ar/SiH4 gas pressure of 50 mTorr by varying the plasma power: (a) 20 W, (b) 30 W, and (c) 40 W.