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. Author manuscript; available in PMC: 2020 Sep 21.
Published in final edited form as: Nanoscale. 2019 Aug 27;11(35):16228–16234. doi: 10.1039/c9nr05630k

Figure 3.

Figure 3.

Bleaching steps analysis of 15 and 64 nm hole mask patterns and sample raw bleaching data. Most of the 15 nm spots exhibit only single bleaching steps with a maximum of 2 steps, while the larger 64 nm spots show mostly 2 bleaching steps and a maximum of 4 steps. Example plots of fluorescence intensity versus a number of frames or time are shown above. The upper left plot shows a single bleaching step, indicative of a single fluorophore present, whereas the upper right plot shows multiple bleaching steps.