Fig. 1. Schematic illustration of PEDOT synthesis by the oCVD method.

(A) The postdeposition acidic rinsing step (e.g., MeOH or HBr rinsing) is generally used for poly(3,4-ethylene dioxythiophene) (PEDOT) films grown using FeCl₃ as an oxidant to remove unreacted oxidants and oxidation by-products and increasing conductivity. (B) Synthesizing PEDOT using VOCl₃ as an oxidant does not require the acidic rinsing treatment, and the fabricated film is directly used in device fabrication as a true single-step, all-dry process.