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. Author manuscript; available in PMC: 2020 Jul 17.
Published in final edited form as: ACS Appl Mater Interfaces. 2019 Jul 2;11(28):25578–25585. doi: 10.1021/acsami.9b06594

Figure 5.

Figure 5.

Cleaning polydimethylsiloxane (PDMS) stamps using isopropanol (IPA) and toluene reduces contaminants in van der Waals heterostructures (vdWHs). Topography (left) and photothermal induced resonance absorption spectra (right) obtained at the marked locations on vdWHs fabricated using the all-dry transfer method by overlaying two flakes of hexagonal boron nitride (hBN/hBN) using PDMS stamps pre-cleaned with (a) IPA and (b) toluene. Scale bars represent 2 μm.