Table 1.
Year/Reference | 2012 Rosenstein. et al.6 | 2015 Balan et al.21 | 2016 Shekar et al.8 | 2019 This work |
---|---|---|---|---|
Pore material | SiNx | SiNx | a-Si/SiOx | a-Si/SiOx |
Substrate material | Silicon | Fused-silica | Silicon | Fused-silica |
Pore thickness | 10 nm | 100 nm | ~ 3 nm | ~ 3 nm |
Pore diameter | 4 nm | 4 nm | < 2 nm | < 2 nm |
vn | ||||
Camp | 2.15 pF | 20 pF | 4 pF | ~3.25 pF |
Cpore | 6 pF | 1 pF | ~10 pF | 1–2 pF |
ΣC | 8.15 pF | 21 pF | 14 pF | 4–5 pF |
Highest bandwidth of translocations reported | 1 MHz (dsDNA) | 1 MHz (dsDNA) | 5 MHz (ssDNA) | 10 MHz (ssDNA) |
Input-referred noise at 1 MHz bandwidth | 155 pA rms | 110 pA rms | 128 nA rms | 65 nA rms |