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. Author manuscript; available in PMC: 2020 Jul 18.
Published in final edited form as: Methods Enzymol. 2019 Jul 18;628:191–221. doi: 10.1016/bs.mie.2019.06.016

Table 2.

Preparation of different photoresist formulations. All formulations are listed as weight percentages. After mixing all components, mix on a bottle roller until all resin is dissolved. Note that photoresist resins are inhalation hazards and a respirator should always be worn when handling, especially outside a fume hood. Suggested processing parameters for various feature heights are often provided by the photoresist manufacturer.

Formulation Layer
Thickness (μm)
Resin
(wt %)
γ-Butyrolactone (wt
%)
Photoinitiator
(wt %)
1002F 10 10 – 30 49 46.1 4.9
1002F 50 25 – 100 61 32.9 6.1
1002F 100 100 – 200 64 29.6 6.4
SU-8 5 5 – 15 52 43.0 5.0
SU-8 10 10 – 30 59 36.0 5.0
SU-8 25 15 – 40 63 32.0 5.0
SU-8 50 40 – 100 69 26.0 5.0
SU-8 100 100 – 250 73 22.0 5.0