Cleaning of seed aerosol particle generator (Study 1: high temperature furnace Study 2: arc discharge) |
Study 1: The lid and bottom of the furnace were removed and cleaned with a brush and a drill. The tubing was cleaned with compressed air. Study 2: The arc was disassembled and the different parts were cleaned with a brush. |
1/2 |
Open ventilated cupboard/Open bench |
Full face mask (ABE+P3), cleanroom gown, gloves, shoe covers, hairnet |
Cleaning of DMA and aerosol filter exchange |
The DMA was disassembled and cleaned with a brush and ethanol. Some parts were cleaned with compressed air. The aerosol filter was changed. |
1/2 |
Open ventilated cupboard/open LAF bench |
Full face mask (ABE+P3), cleanroom gown, gloves, shoe covers, hairnet |
Inspection of reactor |
The top of the reactor was opened and the inside was inspected with an endoscope. |
1 |
Ventilated cupboard |
Full face mask (ABE+P3), disposal coveralls, shoe protection, gloves |
Automatic reactor cleaning |
Computer work was performed. The reactor was automatically cleaned with nitrogen gas. |
1 |
Ventilated cupboard |
Full face mask (ABE+P3), disposal coveralls, shoe protection, gloves |
Manual reactor cleaning |
The reactor was opened and manually cleaned with a steel wire and a cleanroom vacuum cleaner. |
1 |
Ventilated cupboard |
Full face mask (ABE+P3), disposal coveralls, shoe protection, gloves |
Exchange of NW outflow filter(s) |
Tubes were disconnected, holders were cleaned with ethanol, and filter(s) were exchanged. |
1/2 |
Open ventilated cupboard |
Full face mask (ABE+P3), cleanroom gown, gloves, shoe covers, hairnet |
Leak test |
Different parts of the reactor cupboard were opened, leak tests were performed with helium. |
2 |
Open ventilated cupboard |
Full face mask (ABE+P3), cleanroom gown, gloves, shoe covers, hairnet |
Work in glove box |
GaAs NWs were being harvested. |
1/2 |
Glove box with over-pressure |
Cleanroom gown, gloves, shoe covers, hairnet |
Production of GaAs NWs |
Computer work was performed. Supervision of the production was conducted. |
1/2 |
Closed system |
Cleanroom gown, gloves, shoe covers, hairnet |
Post-production laboratory
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Sonication of substrates with Si NWs |
Substrates with Si NWs (grown from gold seed particles) were transferred into liquid and sonicated. Work bench was cleaned. |
1/2 |
LAF bench/Open bench |
Eye googles, protective gown, gloves/Full face mask (ABE+P3), protective gown, gloves |
Handling of substrates with Si NWs |
Substrates with Si NWs (grown from gold seed particles) were shaken in an open box and transferred to another box. |
2 |
Parts in LAF bench, parts on open bench |
Full face mask (ABE+P3), protective gown, gloves |