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. 2019 Nov 27;2019:3495841. doi: 10.34133/2019/3495841

Figure 2.

Figure 2

Fabrication process of the biomimetic antireflective nanohole array. (a) Preparation of the monolayer of PS nanospheres on Si substrates. (b) Creation of the Si stamp by RIE with nanospheres as a mask. (c) Fabrication of the biomimetic antireflective nanohole array with nanoimprint lithography.