Table 4.
Goodness of fit for developed models of the process responses, during the cold plasma treatments on wheat flour.
| Responses | χ 2 | RMSE | MBE | MPE | r 2 | Skew | Kurt | Mean | StDev | Var |
|---|---|---|---|---|---|---|---|---|---|---|
| AOH | 18.779 | 3.856 | 0.000 | 19.474 | 0.927 | −0.756 | −0.179 | 0.000 | 3.939 | 15.513 |
| AME | 7.828 | 2.489 | 0.000 | 4.427 | 0.961 | 0.025 | −0.072 | 0.000 | 2.543 | 6.466 |
| TEN | 16.923 | 3.660 | 0.000 | 11.794 | 0.929 | −0.038 | 0.681 | 0.000 | 3.739 | 13.980 |
| T | 2.168 | 1.310 | 0.000 | 3.427 | 0.956 | −0.579 | −0.210 | 0.000 | 1.338 | 1.791 |
| M | 0.024 | 0.137 | 0.000 | 0.816 | 0.918 | 0.515 | −0.177 | 0.000 | 0.140 | 0.020 |
AOH—reduction of alternariol; AME—reduction of alternariol monomethyl ether; TEN—reduction of tentoxin; T—temperature of wheat flour sample after treatment; M—moisture of wheat flour sample after treatment; χ2—reduced chi-square; RMSE—root mean square error; MBE—mean bias error; MPE—mean percentage error; r2—coefficient of determination; Skew—skeweness; Kurt—kurtoisis; Mean—mean values of residuals; StDev—standard deviation of residuals; Var—variance of residuals.