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. 2020 Jan 9;11:167. doi: 10.1038/s41467-019-13905-9

Fig. 6. Pulse duration dependence of the diffraction imaging process.

Fig. 6

Influence of the pulse duration on the beam damage as function of photon energies as well as beam damage for different photon energies as function of pulse length (inset). The calculations are performed for a 1000-unit sucrose cluster exposed to intense XFEL pulses with 25 μJ/μm2. The shaded area indicates the water window.