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The three main steps of FEBID and FIBID under cryogenic conditions are sketched: (a) The precursor is dosed for a given time on a cooled substrate, giving rise to a condensed layer of precursor; (b) The focused electron or ion beam irradiates the precursor condensed layer with the wanted pattern; (c) The substrate is heated to above room temperature, which produces the sublimation of the unirradiated precursor and the emergence of the desired deposit.
