Skip to main content
. 2019 Nov 21;10(12):799. doi: 10.3390/mi10120799

Figure 7.

Figure 7

Comparison of charge-particle-based lithography techniques in terms of the required charge dose per area and the process complexity. The single-step or multi-step character of the technique is considered a means to classify it as a process with less or more complexity, respectively. Cryo-FIBID requires the lowest charge dose amongst the single-step techniques.