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. 2020 Jan 21;10:874. doi: 10.1038/s41598-019-56787-z

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© The Author(s) 2020

Open Access This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/.

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(a–c) Illustrations of hybrid patterning process assisted by metal-mesh with varying gap distances (D) between the mesh and the substrate; (a) D = 0.0 mm, (b) 0.8 mm, and (c) 2.0 mm. (d-f) SEM images and AFM line profiles of O₂ plasma-treated PET substrates with various D; (d) D = 0.0 mm, (e) 0.8 mm, and (f) 2.0 mm, respectively. (g) The AFM line profile with respect to various gap distances. (h) Comparison of roughness between the region under mesh (shadow zone) and the region under mesh hole (exposure zone) with respect to various D.