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. 2020 Jan 3;13(1):200. doi: 10.3390/ma13010200

Figure 1.

Figure 1

Graphical representation of the used two-beam direct laser interference patterning (DLIP) process, showing the most relevant parameters describing both the pattern and the process: ω—beam radius; θ—beams intersection angle; Λ—laser intensity profile/ ablated structure period; d—distance between the laser spots; OVP—spot overlap; v—samples’ translation speed; rth—radius of ablated area; h—ablated structure depth.