Figure 10.

FDTD simulation of a layered system that includes periodic HSFL ${\mathsf{\Lambda }}_{\mathrm{HSFL}}^{\perp }$ = 100 nm given by the real structures shown in the SEM micrograph on the top left (A), HSFL modulation depth d_HSFL = 75 nm, no added roughness ($R_{\mathrm{HSFL}}$= 0 nm) and oxide layer thickness T_ox = 100 nm. The intra oxide film position varies between Z = 150 nm (B), Z = 100 nm (C), Z = 75 nm (D), Z = 50 nm (E), and Z = 25 nm (F). The laser beam (λ = 800 nm) polarization direction is horizontal. The colors of the intensity plots are encoded in a false color scheme where red indicated deviations above and blue below the average intensity value of the image, represented in white.