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. 2020 Jan 17;10(1):167. doi: 10.3390/nano10010167

Figure 3.

Figure 3

Investigation of the surface roughness of NiO photocathodes implementing a blocking layer electrochemically deposited at 1.00 V (top left), 1.05 V (top right), 1.10 V (bottom left) or deposited by Sol-Gel (bottom right).