Skip to main content
. 2020 Jan 27;13(3):586. doi: 10.3390/ma13030586

Figure 2.

Figure 2

Deposition rate of T4 on silicon wafer substrate during wettability and nanoparticle modification. Deposition in either argon or oxygen plasma led to wettability modification. ZnO nanoparticle functionalization of T4 polymers is carried in O2 plasma.