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. 2020 Feb 8;13(3):777. doi: 10.3390/ma13030777

Figure 3.

Figure 3

(a,b) Atomic force microscope (AFM) images of the surface morphology of as-deposited Ni layer and after Ni/G electrodes. (c,d) Raman mapping of Id/IG ratio and I2D/IG ratio of (b). (e) Scheme of change of surface morphology and graphene fabrication during the plasma-enhanced chemical vapor deposition (PECVD) process.