Table 3. Coulombic efficiency (C.E.) and depth-of-discharge (DOD) levels for various Zn metal strategies.

Strategy	Current density (mA cm–2)	Areal capacity (mA h cm–2)	C.E. (%)	Zn thickness (or mg cm–2)	DOD a (%)	Ref.
Polyamide coating	0.4	0.4	95.12	20 μm	85	49
High concentration electrolyte	1	0.1	99.7	n/a		43
Epitaxial graphene substrate	40	3.2	99.7		50 b	57
Polyacrylamide additive & Cu mesh	20	5	∼100		80 b	34
Triethylphosphate additive	0.5	2.5	99.68	250 μm	3.4	33
Sodium dodecylbenzene sulfonate additive	n/a			200 μm	0.2	38
Au-NP coating	0.5	0.5	97.1	20 μm	17	45
Graphite fiber host	1	1	∼96 c		16.7 b	53
Ni-triflate additive	0.2	0.2	99	n/a		37
3 M Zn-triflate	Cyclic voltammetry		∼100 c	n/a		31
Zn(TFSI)2–acetamide	0.5	1	98	20 μm	35	40
Polyethyleneamine additive	1.6	3.2	95	n/a		35
Carbon powder mixture	n/a			Zn 1.8 mg cm–2, MnO2 5.4 mg cm–2	59	46
ZIF-8 host	2	1	99.7		20 b	54

^aIn most cases, except for ref. 49 (polyamide coating) where the DOD value was explicitly stated, the DOD values were calculated based on the information given in the manuscript.

^bHost-based strategies do not require Zn thickness levels for DOD calculations.

^cSome reports only state the approximate coulombic efficiency value, hence the ‘∼’ sign.