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TCR, RT resistivity, and processing temperature of V0.8163Ti0.165Ru0.0187O2 and other vanadium oxide-based thermal-sensitive thin films previously reported
| Material | −TCR (%/°C) | Resistivity (Ω·cm) | Processing temperature (°C) | References |
|---|---|---|---|---|
| VOx | ~ 2.7 | 2 | No heating | [45] |
| Mo-doped VOx | 4.0–4.5 | > 1000 | 300 | 3 |
| Mo-doped VOx | 2.5 | 0.3 | No heating | [45] |
| Nb-doped VOx | 2.1 | 0.5 | No heating | [45] |
| Ti-doped VOx | 2.5 | ~ 360 | 370 | [46] |
| Ta-doped VOx | 3.47 | 9.32 | 400 | [47] |
| V0.8163Ti0.165Ru0.0187O2 | 3.47 | 1.55 | 400 | This work |
