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. Author manuscript; available in PMC: 2020 May 11.
Published in final edited form as: Conf Proc IEEE Eng Med Biol Soc. 2019 Jul;2019:5125–5128. doi: 10.1109/EMBC.2019.8857171

Figure 2.

Figure 2.

SEM images of the three different etching recipes. The material on top is photoresist and the smoother material below it is the silicon oxide which has had a trench etched into it.