Skip to main content
. Author manuscript; available in PMC: 2020 May 13.
Published in final edited form as: ACS Mater Lett. 2019 Dec 3;2(1):76–83. doi: 10.1021/acsmaterialslett.9b00438

Figure 1.

Figure 1.

General scheme for chemical lift-off lithography. An oxygen-plasma-activated polydimethylsiloxane (PDMS) stamp is brought into contact with a metal or semiconductor surface functionalized with a self-assembled monolayer (SAM), in this case, 11-mercapto-1-undecanol. Lift-off of the PDMS stamp removes SAM molecules only in the contacted regions, patterning remaining SAMs on the substrate surfaces.